ICHOR HOLDINGS, LTD. (NASDAQ:ICHR) Files An 8-K Results of Operations and Financial Condition
On January17,2018, Ichor Holdings, Ltd. (the “Company”) issued a press release announcing preliminary fourth quarter 2017 financial results and first quarter 2018 outlook. A copy of the press release is furnished with this Form8‑K as Exhibit99.1. The Company is also announcing its fourth quarter 2017 conference call to be held on February7,2018 at 1:30p.m. Pacific time to discuss these results.
The information contained under Item 2.02 of this Current Report on Form8‑K (including Exhibit99.1) is being furnished and shall not be deemed “filed” for purposes of Section18 of the Securities Exchange Act of 1934, as amended (the “Exchange Act”), or otherwise subject to the liabilities of that section, nor shall it be deemed incorporated by reference in any filing under the Securities Act of 1933, as amended, or the Exchange Act, except as expressly set forth by specific reference in such a filing.
The Company uses the “Investors” section of its website (ir.ichorsystems.com) as a means of disclosing material non‑public information and for complying with its disclosure obligations under RegulationFD.
EX-99.1 2 ichr-ex991_6.htm 2017 Q4 PRELIMINARY EARNINGS RELEASE ichr-ex991_6.htm Exhibit 99.1 Ichor Announces Preliminary Fourth Quarter 2017 Financial Results and First Quarter 2018 Outlook; as well as Timing of Q4 Conference Call FREMONT,…
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About ICHOR HOLDINGS, LTD. (NASDAQ:ICHR)
Ichor Holdings, Ltd. is engaged in the design, engineering and manufacturing of fluid delivery subsystems for semiconductor capital equipment. The Company’s primary offerings include gas and chemical delivery subsystems, collectively known as fluid delivery subsystems. Its gas delivery systems consist of gas lines, each controlled by a series of mass flow controllers, regulators, pressure transducers and valves, and an integrated electronic control system. Its gas delivery subsystems are used in equipment for dry manufacturing processes, such as etch, physical vapor deposition, epitaxy and strip. Its chemical delivery subsystems are used to precisely blend and dispense reactive chemistries and colloidal slurries critical to the specific wet front-end process, such as wet clean, electro chemical deposition (ECD) and chemical-mechanical planarization (CMP). It manufactures various components for internal use in fluid delivery systems and for direct sales to its customers.